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handle: 10261/48212
GaSb incorporation to InAs/GaAsquantumdots is considered for improving the opto-electronic properties of the systems. In order to optimize these properties, the introduction of an intermediateGaAslayer is considered a good approach. In this work, we study the effect of the introduction of aGaAsintermediatelayer between InAsquantumdots and aGaSb capping layer on structural and crystalline quality of these heterostructures. As the thickness of the GaAsintermediatelayer increases, a reduction of defect density has been observed as well as changes of quantumdots sizes. This approach suggests a promising method to improve the incorporation of Sb to InAs heterostructures.
This work was supported by the Spanish MCI (projects TEC2008-06756-C03-02/TEC and CONSOLIDER INGENIO 2010 CSD2009-00013) and the Junta de Andalucía (PAI research group TEP-120; project P08-TEP-03516).
Peer reviewed
Quantumdots, GaAs–GaSb–InAs, Defects, Transmission electron microscopy
Quantumdots, GaAs–GaSb–InAs, Defects, Transmission electron microscopy
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