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Advanced Materials
Article . 2005 . Peer-reviewed
License: Wiley Online Library User Agreement
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DIGITAL.CSIC
Article . 2011 . Peer-reviewed
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Bottom–Up Fabrication of Carbon‐Rich Silicon Carbide Nanowires by Manipulation of Nanometer‐Sized Ethanol Menisci

Authors: Tello Ruiz, Marta; García García, Ricardo; Martín-Gago, José A.; Martínez Cuadrado, Nicolás Francisco; Martín-González, Marisol; Aballe, Lucía; Baranov, Alexis; +1 Authors

Bottom–Up Fabrication of Carbon‐Rich Silicon Carbide Nanowires by Manipulation of Nanometer‐Sized Ethanol Menisci

Abstract

A nanometer-sized ethyl alcohol meniscus induced between a conductive atomic force microscope tip and a silicon surface (see Figure) allows the fabrication of nanodots or nanowires of SiCx at a predetermined position on the substrate. The meniscus size and kinetic parameters control the nanostructure size.

This work was supported by Ministerio de Educacion y Ciencia (Spain) contract number MAT2003-02655 and the European Commission, contract number NAIMO Integrated Project No NMP4-CT-2004-500355.

4 páginas, 3 figuras.

Peer reviewed

Country
Spain
Keywords

Lithography, inorganic, Nano, Nanostructures

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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54
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