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Epitaxial thin films of HfO2 doped with La have been grown on SrTiO3(001) and Si(001), and the impact of the La concentration on the stabilization of the ferroelectric phase has been determined. Films with 2-5 at. % La doping present the least amount of paraelectric monoclinic and cubic phases and exhibit the highest polarization, having a remanent polarization above 20 μC/cm2. The dopant concentration results in an important effect on the coercive field, which is reduced with increasing La content. Combined high polarization, high retention, and high endurance of at least 1010 cycles is obtained in 5 at. % La-doped films.
Silicon, Ferroelectric oxides, Ferroelectricity, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Thin films, Monoclinic phase, Paraelectrics, Lanthanum, Polarization, Epitaxial oxide on silicon, Epitaxial growth, Semiconductor doping, Silicon compounds, Ferroelectric HfO2, Epitaxial oxides on silicon, Thin-films, Ferroelectric films, La doping, Ferroelectric phasis, Ferroelectric HfO 2, Epitaxial HfO 2, Hafnium oxides, Strontium titanates, Epitaxial thin films, Epitaxial HfO2, Titanium compounds
Silicon, Ferroelectric oxides, Ferroelectricity, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Thin films, Monoclinic phase, Paraelectrics, Lanthanum, Polarization, Epitaxial oxide on silicon, Epitaxial growth, Semiconductor doping, Silicon compounds, Ferroelectric HfO2, Epitaxial oxides on silicon, Thin-films, Ferroelectric films, La doping, Ferroelectric phasis, Ferroelectric HfO 2, Epitaxial HfO 2, Hafnium oxides, Strontium titanates, Epitaxial thin films, Epitaxial HfO2, Titanium compounds
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