Powered by OpenAIRE graph
Found an issue? Give us feedback
image/svg+xml art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos Open Access logo, converted into svg, designed by PLoS. This version with transparent background. http://commons.wikimedia.org/wiki/File:Open_Access_logo_PLoS_white.svg art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos http://www.plos.org/ Recolector de Cienci...arrow_drop_down
image/svg+xml art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos Open Access logo, converted into svg, designed by PLoS. This version with transparent background. http://commons.wikimedia.org/wiki/File:Open_Access_logo_PLoS_white.svg art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos http://www.plos.org/
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
DIGITAL.CSIC
Conference object . 2017
Data sources: DIGITAL.CSIC
https://doi.org/10.20906/cps/c...
Article . 2015 . Peer-reviewed
Data sources: Crossref
versions View all 3 versions
addClaim

Nano-patterning of surfaces by ion sputtering: numerical study of the damping effect on the anisotropic Kuramoto-Sivashinsky equation

Authors: Vitral, Eduardo; Walgraef, Daniel; Pontes, José; Rabello dos Anjos, Gustavo; Mangiavacchi, Norberto;

Nano-patterning of surfaces by ion sputtering: numerical study of the damping effect on the anisotropic Kuramoto-Sivashinsky equation

Abstract

This paper presents a numerical approach to a model describing the pattern formation by ion beam sputtering on a material surface. This process is responsible for the appearance of unexpectedly organized patterns, such as ripples, nanodots and hexagonal arrays of nanoholes. A numerical analysis of preexisting patterns is proposed to investigate surface dynamics, based on a model derived from a anisotropic damped Kuramoto-Sivashinsky equation, in a two dimensional surface with periodic boundary conditions. While deterministic, its highly nonlinear character gives a rich range of results, making it possible to describe accurately different patterns. A finite-difference semi-implicit splitting scheme is employed on the discretization of the governing equation. Simulations were conducted with realistic coefficients related to physical parameters (anisotropies, beam orientation, diffusion). The stability of the numerical scheme is verified with time step and grid spacing tests for the pattern evolution. Hexagonal patterns were obtained from a monomodal initial condition for a higher value of the damping coefficient, while spatiotemporal chaos appeared for lower values. The hexagonal ordered character of the structure was shown to be directly proportional to the damping coefficient.

Series Editors: da Costa Mattos, Heraldo, Martins Costa, Maria Laura, Laredo dos Reis, João.

No

Country
Spain
Keywords

Kuramoto-Sivashinsky equation, Finite-difference method, Pattern formation, Sputtering

  • BIP!
    Impact byBIP!
    selected citations
    These citations are derived from selected sources.
    This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
    0
    popularity
    This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
    Average
    influence
    This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
    Average
    impulse
    This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
    Average
    OpenAIRE UsageCounts
    Usage byUsageCounts
    visibility views 26
    download downloads 21
  • 26
    views
    21
    downloads
    Powered byOpenAIRE UsageCounts
Powered by OpenAIRE graph
Found an issue? Give us feedback
visibility
download
selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
views
OpenAIRE UsageCountsViews provided by UsageCounts
downloads
OpenAIRE UsageCountsDownloads provided by UsageCounts
0
Average
Average
Average
26
21
Green