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Calibration of photomasks for optical coordinate metrology

Authors: Meli, Felix;

Calibration of photomasks for optical coordinate metrology

Abstract

Optical coordinate measuring machines (CMMs) are widely used in industrial production for fast measurements on complex components. According to ISO 10360-7 the calibration and verification of these CMMs requires certified line scales or grid plates. Additionally, for the determination of the probing error of the imaging probe, masks with form calibrated test circles are compulsory. Using the photomask measuring instrument developed at METAS and using new specific procedures, it is possible to calibrate not only structure positions but also the diameter and roundness of circular structures with competitive uncertainties.

article based on oral presentation at the conference MacroScale 2011 "Recent developments in traceable dimensional measurements", Bern-Wabern (Switzerland), 04-06, October, 2011

Country
Germany
Keywords

optical coordinate metrology, photomask, ISO 10360-7, test circle, roundness

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
0
Average
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