This report summarizes the development of a process for producing a Silicon Electron Multiplier (SiEM) demonstrator based on Deep Reactive Ion Etching (DRIE). This work was carried out under WP13 of the AIDAinnova project as a Blue-Sky R&D activity. The fabrication method, trials, and validation through simulation are described. The current status of demonstrator production, developed characterisation tools, and parallel alternative developments are presented. Challenges encountered are highlighted, and the most promising future directions are discussed.