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Excimer Laser Micromachining/Marking

descriptionPublicationkeyboard_double_arrow_right Article , Other literature type 01 Sep 1989Publisher:SAE InternationalJournal:SAE Technical Paper Series, volume 1 (issn: 0148-7191, eissn: 2688-3627, Copyright policy )
Authors: Michael J. Scaggs; Ulrich Sowada; Jack C. Andrellos;

doi: 10.4271/892257

Excimer Laser Micromachining/Marking

Abstract

<div class="htmlview paragraph">The present generation of industrial ultraviolet light (UV) excimer lasers are being used in a growing number of demanding production and prototype application work that had previously been beyond the capabilities of such thermal sources as CO<sub>2</sub>, operating at 10.6 μm, or Nd:YAG and Nd:Glass, operating at 1.06 μm range. The high photon energy and the very short duration of the excimer pulses can efficiently initiate photochemical and/or photothermal surface reactions leading to precision micromachining, indelible marking, and microstructure modification.</div>

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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Average
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