
doi: 10.3390/app12094332
The cells in dynamic random access memory (DRAM) degrade over time as a result of aging, leading to poor performance and potential security vulnerabilities. With a globalized horizontal supply chain, aged counterfeit DRAMs could end up on the market, posing a significant threat if employed in critical infrastructure. In this work, we look at the retention behavior of commercial DRAM chips from real-time silicon measurements and investigate how the reliability of DRAM cells degrade with accelerated aging. We analyze the retention-based errors at three different aging points to observe the design-induced variations, analyze the pattern dependency, and explore the impacts of accelerated aging for multiple DRAM vendors. We also investigate the DRAM chips’ statistical distribution to attribute the vital wear-out effects present in DRAM. We see a continuous increase in retention error as DRAM chips age and therefore infer that the aged retention signatures can be used to differentiate recycled DRAM chips in the supply chain. We also discuss the roles of device signature in DRAM aging and aging-related security implication on DRAM row-hammer error.
time-dependent dielectric breakdown (TDDB), Technology, QH301-705.5, T, Physics, QC1-999, bias temperature instability (BTI), dynamic random access memory (DRAM), Engineering (General). Civil engineering (General), Chemistry, retention error, accelerated aging, TA1-2040, Biology (General), QD1-999
time-dependent dielectric breakdown (TDDB), Technology, QH301-705.5, T, Physics, QC1-999, bias temperature instability (BTI), dynamic random access memory (DRAM), Engineering (General). Civil engineering (General), Chemistry, retention error, accelerated aging, TA1-2040, Biology (General), QD1-999
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