Dry Etching to form Submicron Features in CMR Oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 1999 English Publisher:Springer Science and Business Media LLCJournal:MRS Proceedings, volume 574 (issn: 0272-9172, eissn: 1946-4274,

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Authors: K. P. Lee; K. B. Jung; H. Cho; D. Kumar; S. V. Pietambaram; R. K. Singh; P. H. Hogan; +3 Authors

doi: 10.1557/proc-574-341

Dry Etching to form Submicron Features in CMR Oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3

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Abstract

AbstractEffective pattern transfer into (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3 has been achieved using Cl2/Ar discharges operated under Inductively Coupled Plasma conditions. Etch rates up to 900 Å-min−1 for (La,Sr)MnO3 and 300 Å-min−1 for (Pr,Ba,Ca)MnO3 were obtained, with these rates being a strong function of ion flux, ion energy and ion-to-neutral ratio. The etching is still physically-dominated under all conditions, leading to significant surface smoothing on initially rough samples. Sub-micron (0.35 μm) features have been produced in both materials using SiNx as the mask.

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