The intensity distribution in the quasi-far-field plane of a high-power laser beam is often dominated by the phase variations in the near field amplitude distribution. Diffraction limited performance can be obtained with static phase correction, adaptive optics or phase conjugation, but presently these approaches are expensive, difficult to implement or not yet available for the high-power laser. Alternatively, laser beam propagation through a distribution of phase elements in the near-field can provide improved uniformity in the far-field plane of a focusing system. The fabrication of distributed phase plates involves the combination of microelectronic mask generation and thin film vapor deposition.