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Limits of optical lithography

Authors: David A. Markle;

Limits of optical lithography

Abstract

The performance requirements of optical lithography equipment are driven by DRAM memory chips which require a 30% reduction in line width and a three-fold increase in resolution elements every generation. Until now semiconductor chips were small enough that arrays of them could be placed in the field of a lithography lens. This placed the emphasis on higher resolution for each new lens generation. The development of the 16-Mb DRAM has changed our priorities. The next generation of memory chips and all those to follow will require substantial increases in field sizes as well as resolution and therefore a more aggressive development pace. Within only a few short generations, conventional resolution lenses will approach 500 lb in weight and $1M in cost.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
0
Average
Average
Average
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