
handle: 11693/37715 , 11693/37474 , 11693/37475 , 11693/37585 , 11693/37514 , 11693/37693 , 11693/37737 , 11693/37497
handle: 11693/37715 , 11693/37474 , 11693/37475 , 11693/37585 , 11693/37514 , 11693/37693 , 11693/37737 , 11693/37497
Through the Nonlinear Laser Lithography method, we demonstrate the first computer generated holograms fabricated deep inside Silicon. Fourier and Fresnel holograms are fabricated buried inside Si wafers, and a generation algorithm is developed for hologram fabrication.
Lithography, Holography, Image acquisition, Holograms, Silicon wafers, Fabrication, Fourier, Nonlinear lasers, Computer generated holograms, Fresnel holograms, Imaging systems, Chemical analysis, Units of measurement, Generation algorithm, Adaptive optics, Laser applications, Si wafer
Lithography, Holography, Image acquisition, Holograms, Silicon wafers, Fabrication, Fourier, Nonlinear lasers, Computer generated holograms, Fresnel holograms, Imaging systems, Chemical analysis, Units of measurement, Generation algorithm, Adaptive optics, Laser applications, Si wafer
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