Photolithography is a well-established technique for patterning electronic circuits, biological assay devices, and plasmonic circuits and is currently used in the semiconductor industry for making integrated circuits [1]. The method has served for decades in patterning a variety of materials over large areas but is not compatible for patterning on surfaces that are sensitive to light or etchants. It has severe limitations when it comes to high-resolution patterning. An alternative to photolithography that could afford rapid prototyping as well as patterning of a wider range of materials is highly desirable. Soft lithography techniques, developed in 1993 by the Whitesides group at the Harvard University, meet some of these requirements and holds a great promise.