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Article . 2013 . Peer-reviewed
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Article . 2012 . Peer-reviewed
License: IOP Copyright Policies
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Si/SiGe Tunneling Static Random Access Memories

Authors: Gary Ternent; Douglas J. Paul;

Si/SiGe Tunneling Static Random Access Memories

Abstract

One of the limits to the low power operation of MOSFET devices is the minimum subthreshold slope defined by the p-n junctions in the devices. A tunneling static random access memory is demonstrated with a supply voltage of 0.42 V, well below the minimum supply voltage that MOSFET technology is capable of delivering. The memory is produced using two Si/SiGe resonant tunneling diodes with peak voltages of 0.175 V fabricated on top of a silicon substrate.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
2
Average
Average
Average
bronze