Microfabrication of LiNbO3 by Reactive Ion-Beam Etching

descriptionPublicationkeyboard_double_arrow_right Article 01 Aug 1980Publisher:IOP PublishingJournal:Japanese Journal of Applied Physics, volume 19, page L463 (issn: 0021-4922, eissn: 1347-4065,

Authors: Toshiya Yamato; Susumu Namba; Shinji Matsui; Hiroaki Aritome;

doi: 10.1143/jjap.19.l463

Microfabrication of LiNbO3 by Reactive Ion-Beam Etching

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Abstract

The ratio of the etching rate of LiNbO3 to AZ1350 at normal incidence for CHF3 ion is about 5 times as large as that for Ar ion. This high ratio is utilized to fabricate LiNbO3 blazed gratings and also LiNbO3 guided wave optical elements such as grating couplers to demonstrate that reactive ion-beam etching is a very useful microfabrication technique for LiNbO3.

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Osaka University
Japan

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