Airborne molecular contamination (AMC) in the form of bases, acids and condensable organic and inorganic substances threaten both costly and sensitive optics and mask pattern formation in the chemically amplified resists (CAR) used for both E-beam and laser lithography. This is particularly so for mask pattern generators due to the relatively long writing times. In the development work of the SLM-based DUV-laser mask pattern generator Sigma7300, AMC aspects have been taken into consideration from an early stage. That includes e.g. analysis and selection of construction materials and development of handling methods as well as application of chemical filtering systems. Tool manufacturer and filter supplier have together specified and designed efficient hybrid filtration systems for use in Sigma7300. This paper describes AMC aspects specific for mask pattern generators, the successful design actions of the Sigma7300 and verifying analyses of the processes.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.