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Optimization of E th method for DUV process inline monitor

descriptionPublicationkeyboard_double_arrow_right Article , Other literature type 01 Jul 2002Publisher:SPIEJournal:SPIE Proceedings, volume 4,689, page 1,143 (issn: 0277-786X, Copyright policy )
Authors: Wenzhan Zhou; Hao Chen; Teng H. Ng; Hui Kow Lim;

doi: 10.1117/12.473442

Optimization of E th method for DUV process inline monitor

Abstract

In this paper, we describe the optimization strategy for Eth (Dose to clear) method of DUV resist process control for 0.25um technology. Both experimental and simulation results will be presented to show the optical and developing behaviors of DUV resist in extreme low energy exposure condition. Based on these data we proposed an optimized method of Eth measurement. With this method, false alarm of DUV resist photo-speed and exposure out of control will be eliminated, cost of manpower for OOC troubleshooting will be saved.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
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