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Stable and uniform electron emission from nanostructured carbon films

Authors: Kyung Ho Park; Seungho Choi; Kyung Moon Lee; Soonil Lee; Ken Ha Koh;

Stable and uniform electron emission from nanostructured carbon films

Abstract

We have systematically studied the electron-emission characteristics of nanostructured carbon films with various amounts of nanoclusters and degrees of nanotube alignment. According to our observation, the dense packing and/or alignment of nanotubes is detrimental to the low-field emission, which we attributed to the electrostatic screening effect. The best emission was observed from the carbon films dominated by nanoclusters; the turn-on field was 1.6 V/μm and the emission-site density was considerably higher than 5×104 site/cm2. The emission from the nanocluster-dominated film was uniform and stable. Raman spectroscopy identified the nanoclusters as crystalline graphite with some structural defects. It is conceivable that the modification of the boning hybridization at the cluster surface resulted in a diamond-like density of states, and that the corresponding small electron affinity was responsible for the excellent emission the from nanoclusters.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
32
Average
Top 10%
Top 10%
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