TCAD Challenges in the Nanotechnology Era

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 2005Publisher:IEEEJournal:2005 International Conference On Simulation of Semiconductor Processes and Devices

Authors: M.D. Giles;

doi: 10.1109/sispad.2005.201460

TCAD Challenges in the Nanotechnology Era

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Abstract

TCAD process and device modeling has become an essential component of advanced technology development, delivering physical insight into processes and device operation and enabling development and optimization of technology flows. This paper highlights emerging challenges in extending these capabilities into the nanotechnology era, and the opportunities for a hierarchical, physically-based modeling approach to impact the direction of nanotechnology development.

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