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Nanoscale Al-Al and Cu-Cu Contacts

Authors: Liu, Q; Tien, NC; Roberts, RC; McCormick, DT;

Nanoscale Al-Al and Cu-Cu Contacts

Abstract

This paper reports that the forces needed to break Al and Cu native oxide are 0 to 3 muN, and 0 to 0.5 muN, respectively, remarkably less than the previously reported 0.1 N force requirement of breaking Al native oxide. Our modeling and experimental results indicate that nanoscale contact resistance is dominated by local hardening instead of contact force as in conventional contact theories. A microswitch featuring a 60 to 80 nm thick contact electrode is fabricated to demonstrate nanoscale Al contacts.

Country
China (People's Republic of)
Keywords

NEMS, Al, Asperity, Native oxide, Nanoscale, MEMS switch, Contact resistance, Cu

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
0
Average
Average
Average
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