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A Novel Method of Removing Polyimide Sacrificial Layer

Authors: Xinglong Guo; Miao Cai; Lei Liu; Zongsheng Lai; Shouzheng Zhu;

A Novel Method of Removing Polyimide Sacrificial Layer

Abstract

Due to the trade secrets and intellectual property, there are still many aspects of MEMS switches which are not understand well and are currently under investigation. In this paper, our report shows that MEMS can be released using O2 and a little carbon powder at the same time. The relationship between the removing polyimide time and the cure temperature is presented using carbon powder in the quartz vacuum cavity when etching polyimide sacrificial layer. It greatly reduces removing polyimide sacrificial layer time. It is highly important for MEMS fabrication process technology. The process is capable of various applications in surface micromachining process, and can be applied in fabricating RF MEMS switches, tunable capacitors, high-Q suspended inductors and suspended-gate MOSFETs.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
2
Average
Average
Average
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