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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao IEEE Computer Graphi...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
IEEE Computer Graphics and Applications
Article . 2006 . Peer-reviewed
License: IEEE Copyright
Data sources: Crossref
DBLP
Article . 2006
Data sources: DBLP
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CAD/CAM for nanoscale self-assembly

Authors: Aristides A. G. Requicha; Dan Arbuckle;

CAD/CAM for nanoscale self-assembly

Abstract

IEEE Computer Graphics and Applications has a long tradition of addressing CAD/CAM problems, a tradition that extends even beyond the well-known special issue on solid modeling. Here, we discuss the conversion of a standard representation for a solid object (for example, a boundary representation) into a set of complex message-passing instructions for manufacturing the object by a distributed system-a swarm of robots. Nanotechnology is currently hampered by a lack of manufacturing processes capable of both high throughput and high resolution. Direct-writing systems such as electron beam or scanning-probe microscopy are serial and slow but achieve high resolution, whereas various lithographic techniques are parallel and fast but typically have resolutions on the order of the tens of nanometers. Self-assembly, that is, the spontaneous assembly of components into the desired structures, is a promising concept that might lead to a revolution in nanomanufacturing.

Related Organizations
Keywords

User-Computer Interface, Artificial Intelligence, Computer Graphics, Computer-Aided Design, Nanotechnology, Equipment Design

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    popularity
    This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
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    influence
    This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
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    This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
6
Average
Average
Average
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