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Process performance of the ULVAC IW-630 200/300mm implanter

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 2002Publisher:IEEEJournal:Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Authors: T. Rhoad; B. Lovelace; H. Suzuki; K. Niikura; T. McLaughlin;

doi: 10.1109/iit.2002.1258048

Process performance of the ULVAC IW-630 200/300mm implanter

Abstract

The process performance for ULVAC's IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect contamination through the use of a ground magnet. The analyses presented include beam parallelism, energy purity, particle contamination, metals contamination, dose uniformity and repeatability.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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