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Challenges in Reusing Lithography Equipment for Multiple Generations

Authors: Heather B. Banisaukas;

Challenges in Reusing Lithography Equipment for Multiple Generations

Abstract

The capital investment for semiconductor fabrication continues to increase as pricing pressure for microprocessors is greater than ever. This profit margin challenge is especially taxing in the area of lithography as the increasing transistor count also drives an increase in the number of mask layers. The cost of lithography equipment for a leading edge factory today is ~$0.5-1 billion. Intel continues to have an aggressive lithography equipment reuse strategy in order to have a tangible impact on the lithography investment required for each new technology. In this paper, we discuss Intel's most recent focus regarding lithography equipment reuse, better internal business systems and supplier infrastructure to support multi-generational lithography equipment.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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