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Enabling Effective Yield Learning through Actual DFM-Closure at the SoC Level

Authors: Davide Appello; Vincenzo Tancorre;

Enabling Effective Yield Learning through Actual DFM-Closure at the SoC Level

Abstract

The aim of this paper is to extend the intensive yield learning and manufacturability process further into the process life cycle. This necessarily means employing chips of high circuit complexity, up to the final products complexity. In this way, the actual effects that the design flow will have in combining low-levels of IP can be understood more accurately. The paper will also describe how analysis recipes can be used to isolate different behavior effects and associate them to failure cause. We will also demonstrate techniques which can be adopted in the early ramp-up phase to improve the DFM rules maturity level by progressively fine tuning them with respect to the measured data.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
5
Average
Top 10%
Average
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