Powered by OpenAIRE graph
Found an issue? Give us feedback
image/svg+xml art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos Open Access logo, converted into svg, designed by PLoS. This version with transparent background. http://commons.wikimedia.org/wiki/File:Open_Access_logo_PLoS_white.svg art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos http://www.plos.org/ IEEE Accessarrow_drop_down
image/svg+xml art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos Open Access logo, converted into svg, designed by PLoS. This version with transparent background. http://commons.wikimedia.org/wiki/File:Open_Access_logo_PLoS_white.svg art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos http://www.plos.org/
IEEE Access
Article . 2020 . Peer-reviewed
License: CC BY
Data sources: Crossref
image/svg+xml art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos Open Access logo, converted into svg, designed by PLoS. This version with transparent background. http://commons.wikimedia.org/wiki/File:Open_Access_logo_PLoS_white.svg art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos http://www.plos.org/
IEEE Access
Article
License: CC BY
Data sources: UnpayWall
image/svg+xml art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos Open Access logo, converted into svg, designed by PLoS. This version with transparent background. http://commons.wikimedia.org/wiki/File:Open_Access_logo_PLoS_white.svg art designer at PLoS, modified by Wikipedia users Nina, Beao, JakobVoss, and AnonMoos http://www.plos.org/
IEEE Access
Article . 2020
Data sources: DOAJ
DBLP
Article . 2020
Data sources: DBLP
versions View all 3 versions
addClaim

Modeling of the Distribution of Undeformed Chip Thickness Based on the Real Interference Depth of the Active Abrasive Grain

Authors: Mingxia Kang; Lu Zhang; Wencheng Tang;

Modeling of the Distribution of Undeformed Chip Thickness Based on the Real Interference Depth of the Active Abrasive Grain

Abstract

Distribution of the maximum undeformed chip thickness can be approximated as the reproduction of grooves and protrusions of the grinding surface. It plays a very important role in grinding process as it has a close influence on the prediction and modeling of grinding forces, tool life, and surface quality, as well as process stability. In this study, it is investigated from the perspective of the real interference depth of the active abrasive grain to cater to the performance evaluation of the grinding surface. Firstly, image processing techniques combined with three dimensional topography tests are utilized to extract grains' essential characteristics such as the protrusion height, shape, distribution and density. Then, grains' wear is quantified by the probability assignment function and Dempster-Shafer evidence theory. Based on this, the actual interference depth of a single grain is determined. Through grain's kinematics analysis and considering the effect of contact deformation on the actual contact arc length and affective cutting edge density, the distribution of chip thickness in the current grinding area is defined and its distribution model is established. Model's correctness and rationality are verified by grinding experiments of the slider raceway. Results demonstrate the grain's interference depth highly depends on its protrusion height, wear amount and grinding depth which is a primary contributor to the size of undeformed chip thickness, and grains' density, contact deformations mainly affect its distribution. The quantified distribution model of the maximum undeformed chip thickness lays a foundation for the topography modeling and integrity research of grinding surfaces.

Related Organizations
Keywords

Abrasive particles wear, active cutting edges, protrusion height, interference depth, Electrical engineering. Electronics. Nuclear engineering, grinding, image processing, TK1-9971

  • BIP!
    Impact byBIP!
    selected citations
    These citations are derived from selected sources.
    This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
    6
    popularity
    This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
    Top 10%
    influence
    This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
    Average
    impulse
    This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
    Average
Powered by OpenAIRE graph
Found an issue? Give us feedback
selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
6
Top 10%
Average
Average
gold