Deposition and reactive ion etching of molybdenum

Abdelhak Bensaoula; J. C. Wolfe; James A. Oro; A. Ignatiev

Found an issue? Give us feedback

Applied Physics Lett...arrow_drop_down

Applied Physics Letters

Article . 1983 . Peer-reviewed

Data sources: Crossref

https://dx.doi.org/10.1063/1.9...

Article

Data sources: Microsoft Academic Graph

Deposition and reactive ion etching of molybdenum

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 1983 English Publisher:AIP PublishingJournal:Applied Physics Letters, volume 42, pages 122-123 (issn: 0003-6951, eissn: 1077-3118,

Copyright policy )

Authors: Abdelhak Bensaoula; J. C. Wolfe; James A. Oro; A. Ignatiev;

doi: 10.1063/1.93743

Deposition and reactive ion etching of molybdenum

- Summary
- Metrics

Abstract

The stress in molybdenum films deposited by dc magnetron sputtering in neon has been characterized. Fabrication of 1-μ-thick films 2 cm in diameter on polyimide membranes has been achieved with low-stress material. A reactive ion etching process is described with 75-nm resolution and 15:1 aspect ratios.

Related Organizations

University of Houston
United States

Impact byBIP!

	selected citations These citations are derived from selected sources. This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).	8
	popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.	Average
	influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).	Top 10%
	impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.	Average