Attachment-dominated electron-beam-ionized discharges

J. D. Daugherty; J. A. Mangano; J. H. Jacob

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Applied Physics Lett...arrow_drop_down

Applied Physics Letters

Article . 1976 . Peer-reviewed

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https://dx.doi.org/10.1063/1.8...

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Attachment-dominated electron-beam-ionized discharges

descriptionPublicationkeyboard_double_arrow_right Article 15 May 1976 English Publisher:AIP PublishingJournal:Applied Physics Letters, volume 28, pages 581-583 (issn: 0003-6951, eissn: 1077-3118,

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Authors: J. D. Daugherty; J. A. Mangano; J. H. Jacob;

doi: 10.1063/1.88598

Attachment-dominated electron-beam-ionized discharges

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Abstract

In this letter we derive the stability criterion in discharges where two-step ionization is dominant. For stable equilibrium the attachment rate has to be greater than or equal to twice the ionization rate. Two-step ionization is often dominant in discharge-pumped visible lasers because of the relatively large number of electronically excited states. Analysis of the KrF laser discharge indicates that two-step ionization is dominant.

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