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Stoichiometric tungsten carbide coatings

descriptionPublicationkeyboard_double_arrow_right Article , Other literature type 01 Jan 1996Publisher:AIPJournal:AIP Conference Proceedings, volume 378, pages 348-351 (issn: 0094-243X, Copyright policy )
Authors: G. A. Hirata; O. Contreras; M. H. Farías; L. Cota-Araiza;

doi: 10.1063/1.51119

Stoichiometric tungsten carbide coatings

Abstract

Filament Assisted Chemical Vapor Deposition (FA‐CVD) technique has been used to prepare tungsten carbide (WC) thin films. With this simple technique we obtained polycrystalline and stoichiometric WC coatings deposited on crystalline silicon and on stainless steel substrates. Tungsten carbide coatings were studied with Auger Electron Spectroscopy and Scanning Electron Microscopy.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
1
Average
Average
Average
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