Atomic force microscopy (AFM) is a new technology currently being developed. Stylus profilometry (SP) was developed earlier. A procedure is reported here which combines features of both SP and AFM. In this approach a stylus scans a sample surface and responds to contact forces. Force values are maintained within the elastic range of the sample, and high resolution is achieved by means of a sensitive tunnel gap feedback circuit control. Initial tests of performance have been conducted over a range of applied loads with tungsten styluses on phlogopite mica samples to image lamellar steps with subnanometer resolution.