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Bismuth-doped tin telluride

Authors: M. A. Tamor; H. Holloway; R. M. Ager; C. A. Gierczak; R. O. Carter;

Bismuth-doped tin telluride

Abstract

By optimizing the growth conditions and doping with Bi, we have produced epitaxial layers of SnTe with hole concentration as low as 2.6×1018 cm−3. This is more than an order of magnitude less than the smallest carrier concentration reported for undoped bulk crystals (even with heat treatment to reduce the metal vacancy concentration). The hole mobility is found to depend somewhat on the Bi content. Measurements of the refractive index of low carrier concentration SnTe show very little dispersion for wavelengths up to 30 μm.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
10
Average
Top 10%
Average
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