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I.R. "OLYMPIAS"
Article . 2006
Data sources: I.R. "OLYMPIAS"
Applied Physics Letters
Article . 2006 . Peer-reviewed
Data sources: Crossref
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Fermi-level pinning and charge neutrality level in germanium

Authors: Dimoulas, A.; Tsipas, P.; Sotiropoulos, A.; Evangelou, E. K.;

Fermi-level pinning and charge neutrality level in germanium

Abstract

The Schottky barrier height in metal/Ge contacts shows weak dependence on the metal work function indicating strong Fermi-level pinning close to the Bardeen limit. The pinning factor S is about 0.05 and the charge neutrality level (CNL) is only about 0.09eV above the top of the valence band. Because of this, the Fermi level in Ge lies higher than CNL in most cases of interest so that unpassivated acceptorlike gap states at the interface are easily filled, building up a net negative fixed charge. This could prevent efficient inversion of a p-type Ge surface in a metal-oxide-semiconductor structure.

Country
Greece
Keywords

mosfets, ge, schottky barriers, gate, gap, source/drain, band offsets

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    556
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    Top 1%
    influence
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citations
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
556
Top 1%
Top 0.1%
Top 1%
Green