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Negative metal ion sources (invited)

descriptionPublicationkeyboard_double_arrow_right Article 01 Apr 1992 English Publisher:AIP PublishingJournal:Review of Scientific Instruments, volume 63, pages 2,357-2,362 (issn: 0034-6748, eissn: 1089-7623, Copyright policy )
Authors: Yoshiharu Mori;

doi: 10.1063/1.1142928

Negative metal ion sources (invited)

Abstract

A negative metal ion source using plasma sputtering was developed at KEK in 1988 and since then various types of plasma sputter negative metal ion source have been constructed so far at various institutes. In this paper, after theoretical understanding of the negative metal ion formation process on metal surface by plasma sputtering is briefly reviewed, then characteristics and performance of various types of plasma sputter negative ion source which have been developed so far are presented.

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    		 23
    popularity
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    		 Average
    influence
    This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
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    impulse
    This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
    		 Top 10%
Powered by OpenAIRE graph
Found an issue? Give us feedback
selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
23
Average
Top 10%
Top 10%
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