Pulsed laser deposition of CdWO4 thin films

descriptionPublicationkeyboard_double_arrow_right Article 01 Oct 2016 Germany English Publisher:Elsevier BVJournal:Superlattices and Microstructures, volume 98, pages 18-28 (issn: 0749-6036,

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Authors: Kodu, M.; Avarmaa, T.; Jaaniso, R.; Leemets, K.; Mändar, H.; Nagirnyi, V.;

doi: 10.1016/j.spmi.2016.08.007

Pulsed laser deposition of CdWO4 thin films

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Abstract

Abstract Thin CdWO4 films were produced on various substrates by pulsed laser deposition. A method of producing transparent films of high structural and optical quality on MgO substrate was developed. It is based on deposition of an amorphous film from a non-stoichiometric CdWO4–CdO target and a consequent crystallization of the film in oxygen atmosphere at 750 °C. The quality of the films produced was verified by x-ray diffraction, electron probe microanalysis, scanning electron microscopy, Raman and optical spectroscopy.

Country

Germany

Related Organizations

University of Tartu
Estonia
Deutsches Elektronen-Synchrotron DESY
Germany
Helmholtz Association of German Research Centres
Germany

Keywords

info:eu-repo/classification/ddc/530

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