AbstractThis paper investigates a new type of micromachined electric field mill (MEFM) fabricated using a silicon dielectric shutter. The performance of the MEFM is investigated as a function of the dimensional parameters for shutter perforation repetition period, width of perforations and electrodes, shutter thickness, and the gap between shutter and electrodes. Optimum shutter design is found and presented. Furthermore, performance is compared to that of a standard MEFM with an electrically grounded shutter. It is found that the dielectric silicon shutter MEFM has superior performance.