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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Microelectronics Rel...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Microelectronics Reliability
Article . 2004 . Peer-reviewed
License: Elsevier TDM
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Article . 2004
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https://dx.doi.org/10.1016/j.m...
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A review of electrostatic discharge (ESD) in advanced semiconductor technology

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 2004 English Publisher:Elsevier BVJournal:Microelectronics Reliability, volume 44, pages 33-46 (issn: 0026-2714, Copyright policy )
Authors: Steven H. Voldman;

doi: 10.1016/j.microrel.2003.10.004

A review of electrostatic discharge (ESD) in advanced semiconductor technology

Abstract

Abstract Electrostatic discharge protection in semiconductors have undergone both revolutionary and evolutionary changes to maintain pace with the rapidly scaling and changing environment of advanced semiconductor technologies. As a result, it is an area of continuous discovery in both semiconductor development, and design. ESD phenomenon remains a research and development arena for new innovation, invention, and initiatives. In this paper, an introduction to electrostatic discharge protection in semiconductors will be reviewed.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
28
Top 10%
Top 10%
Top 10%
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