Multibeam electron source for nanofabrication using electron beam induced deposition

descriptionPublicationkeyboard_double_arrow_right Article 01 Apr 2006 English Publisher:Elsevier BVJournal:Microelectronic Engineering, volume 83, pages 771-775 (issn: 0167-9317,

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Authors: M.J. van Bruggen; B. van Someren; P. Kruit;

doi: 10.1016/j.mee.2006.01.252

Multibeam electron source for nanofabrication using electron beam induced deposition

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Abstract

A multibeam electron beam induced deposition (EBID) system is presented, which can be used for the fabrication of sub-10nm structures with EBID. This system consists of a scanning electron microscope (SEM) column and a modified source section with a microfabricated lens array. This lens array produces 100 virtual sources that are imaged demagnified onto a wafer to obtain an array of 1nm probes, which is one order of magnitude lower than reported previously on single-column multibeam systems. In this paper, results are presented of tests on the first prototype, showing the functioning of the microlens array.

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Delft University of Technology
Netherlands

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