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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Microelectronic Engi...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Microelectronic Engineering
Article . 2006 . Peer-reviewed
License: Elsevier TDM
Data sources: Crossref
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Magnetic levitation systems compared to conventional bearing systems

Authors: A.T.A. Peijnenburg; J.P.M. Vermeulen; J. van Eijk;

Magnetic levitation systems compared to conventional bearing systems

Abstract

So far, guide ways for positioning systems (stages) in semiconductor applications are often equipped with air bearings and/or roller bearings. Although these passive bearing systems are seemingly rather cost-effective, motion performance and motion capabilities are limited compared to active systems using multiple servo loops. So far, nm-level motion performance in 6 degrees of freedom (DoF) was realized through the application of an isolated machine architecture in combination with a hybrid stage concept, i.e., by stacking an active short stroke system providing fine adjustments on top of a passive long stroke system. This paper describes the development of a full 6-DoF active positioning system with nm-level motion performance in one single (long stroke) stage, using active magnetic bearing systems. It is shown that active bearings provide interesting advantages and additional features for substrate positioning, enabling a rather simple and cost effective stage design, suitable for next generation semiconductor applications.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
45
Top 10%
Top 10%
Average
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