Abstract The continuous and dense Ti–N compound layers with a thickness ranging from 0.7 to 2.1 μm were formed on the titanium by plasma nitriding at 700 °C for different times with hollow cathode discharge assistance. Scanning electron microscope (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) were used to characterize the nitrided layer. XRD and XPS results showed that the compound layer was mainly composed of Ti2N phase. The corrosion current density of 4 h nitrided titanium was 0.016 μA/cm2 (cathode) and 0.03 μA/cm2 (anode), respectively. The electrical conductivity of samples was evaluated by means of the interfacial contact resistance (ICR). The value of 4 h nitrided titanium was 4.94 mΩ-cm2 which was much lower than that of original titanium 26.25 mΩ-cm2 under applied force of 150 Ncm−2 after corrosion test. The results showed that the electrical conductivity and corrosion resistance of the titanium bipolar plates (BPs) were apparently improved with the formation of Ti2N compound layer.