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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Microelectronic Engi...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Microelectronic Engineering
Article . 1993 . Peer-reviewed
License: Elsevier TDM
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Microelectronic Engineering
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Reactive ion etching and plasma etching of tungsten

descriptionPublicationkeyboard_double_arrow_right Article 01 Apr 1993 English Publisher:Elsevier BVJournal:Microelectronic Engineering, volume 21, pages 329-332 (issn: 0167-9317, Copyright policy )
Authors: Patrick Verdonck; G. Brasseur; Jacobus W. Swart;

doi: 10.1016/0167-9317(93)90084-i

Reactive ion etching and plasma etching of tungsten

Abstract

Abstract Tungsten etching has been studied in audio frequent plasmas with NF3-O2 and SF6-O2 mixtures. The influence of etch mode, gas flows, pressure and power has been investigated. It is possible to etch tungsten chemically but large concentrations of free fluorine are needed. These are supplied more easily by NF3 than by SF6. During chemical etching with NF3 fluorine diffuses into the tungsten. When in contact with air, the fluorine is replaced by oxygen, forming a tungsten oxide layer, which withstands further chemical etching.

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citations
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
5
Average
Average
Average
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