A gas phase aluminum deposition was developed for Ni by CVD process. The specimen surface quickly came to equilibrium and remained close to equilibrium for the duration of the coating runs. The kinetics of the process was governed by a combination of solid and gas diffusion rates, and a steady-state appeared to exist at the gas phase-coating interface. By combining Levine, Caves, Sivakumar, and Seigle’s model for gaseous diffusion and calculation of solid diffusion rates, some success has been achieved in explaining the results.