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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Czechoslovak Journal...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Czechoslovak Journal of Physics
Article . 1965 . Peer-reviewed
License: Springer TDM
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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
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Dependence of ultrasonic attenuation in semi-conductors on electric field strength

Dependence of ultrasonic attenuation in semiconductors on electric field strength
descriptionPublicationkeyboard_double_arrow_right Article 01 Apr 1965 English Publisher:Springer Science and Business Media LLCJournal:Czechoslovak Journal of Physics, volume 15, pages 251-256 (issn: 0011-4626, eissn: 1572-9486, Copyright policy )
Authors: Hrivnak, L.; Ozvold, M.;

doi: 10.1007/bf01689691

Dependence of ultrasonic attenuation in semi-conductors on electric field strength

Abstract

The dependence of the ultrasonic attenuation, or amplification, in semi-conductors on the electric field strength is derived. It is shown that the ultrasonic amplification does not increase linearly with the field, but, after reaching a maximum, it again decreases.

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mechanics of particles and systems

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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