Making sub-100 nm structures can also be done in a simple way, that is, by replication. As long as there is a mold, or a stamp, or a master, which has sub-100 nm surface relief structures, these nanostructures can be replicated in the similar fashion as stamping out millions of compact disks (CD). This was the idea proposed in 1995 when Stephen Y. Chou first reported sub-25 nm holes made in PMMA polymer with an imprinting mold and he coined word “nanoimprint” [1]. Nanoimprinting lithography (NIL) has since undergone phenomenal growth. NIL has become a topic area in many international conferences in the last two decades. Many commercial companies have been established, ranging from producing nanoimprinting tools and nanoimprint stamps to exploring commercial applications of NIL technology.