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SID Symposium Digest of Technical Papers
Article . 2022 . Peer-reviewed
License: Wiley Online Library User Agreement
Data sources: Crossref
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P‐3.25: Synergistic effects between Optical Proximity Correction (OPC) and lithography process simulation in display backplane

descriptionPublicationkeyboard_double_arrow_right Article 01 Oct 2022 English Publisher:WileyJournal:SID Symposium Digest of Technical Papers, volume 53, pages 750-752 (issn: 0097-966X, eissn: 2168-0159, Copyright policy )
Authors: Shantao Chen; Meng Zhao; Qiuhua Meng; Ming Liu; Lianjian Li; Zheng Liu; Brian Kao; +1 Authors

doi: 10.1002/sdtp.16081

P‐3.25: Synergistic effects between Optical Proximity Correction (OPC) and lithography process simulation in display backplane

Abstract

In this paper, lithographic simulation tools, including Optical Proximity Correction (OPC), have been applied in designing backplane layout of displays. That will lead to better resolution of lower feature size of the lithography process in display manufacturing with wider process window.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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