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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Progress in Photovol...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Progress in Photovoltaics Research and Applications
Article . 2012 . Peer-reviewed
License: Wiley Online Library User Agreement
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The study of the charge collection of the normal‐collector configuration

Authors: Tan, Chee Chin.; Ong, Vincent K. S.; Radhakrishnan, K.;

The study of the charge collection of the normal‐collector configuration

Abstract

ABSTRACTCharge collection is one of the crucial processes to collect the induced current when a semiconductor sample is subjected to some external excitations such as the electron or photon beams. The charge collection probability is the basis in the study of this induced current particularly in the field of photonic devices, photovoltaic cells as well as in the characterization of semiconductor materials and devices. In this paper, the analytical expressions for the charge collection probability of the finite‐dimension normal‐collector configuration, with and without surface recombination at the free surfaces are presented. An excellent agreement has been found between the charge collection probability profiles computed using the presently derived analytical expressions and those obtained using a device simulator. The results have been used to study the effects of the various physical parameters on the charge collection probability. These analytical expressions are expected to enhance our understanding of the charge collection process. Copyright © 2012 John Wiley & Sons, Ltd.

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Singapore
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Keywords

DRNTU::Engineering::Electrical and electronic engineering

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
2
Average
Average
Average
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