The Interaction of the Supersonic Plasma‐Jet with the Substrate in the RF Plasma‐Chemical Reactor
Copyright policy ) M. Šícha; Z. Hubička; M. Tichý; M. Novák; L. Soukup; L. Jastrabík; J. F. Behnke; V. Kapička; K. Kapoun; M. Šerý;
The Interaction of the Supersonic Plasma‐Jet with the Substrate in the RF Plasma‐Chemical Reactor
AbstractAlthough the plasma‐chemical processes and properties of the deposited thin film can strongly depend on the interaction of the supersonic plasma jet channel with the substrate, up to now the study of this phenomenon has not yet been done. We decided to study this interaction by means of CCD camera. The presented results indicate that the light intensity recorded close to the substrate can be used as a measure of the intensity of plasma‐chemical deposition processes on the substrate surface.
- Charles University Czech Republic
- Masaryk University Czech Republic
- Université franco-allemande Germany
- University of South Bohemia in České Budějovice Czech Republic
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These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
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This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
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