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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Journal of Applied P...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Journal of Applied Polymer Science
Article . 2003 . Peer-reviewed
License: Wiley Online Library User Agreement
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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
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Upgrading of MUF polycondensation resins by buffering additives. II. Hexamine sulfate mechanisms and alternate buffers

Authors: ZANETTI, MICHELA; PIZZI A.;

Upgrading of MUF polycondensation resins by buffering additives. II. Hexamine sulfate mechanisms and alternate buffers

Abstract

AbstractIminoamino methylene bases intermediates are obtained by the decomposition of hexamethylenetetramine (hexamine). These are stabilized by the presence of strong anions such as SO and HSO, that is, “hexamine sulfate.” The effect of hexamine sulfate was closely linked to the strong buffering action it has on MUF resins. Its role is mainly to induce regularity of the reaction and the stability of conditions during resin networking, due to the buffer. Shifting of the polycondensation ⇌ degradation equilibrium to the left appeared to be the determinant factor. This was a consequence of maintaining a higher, constant pH during curing, due to the buffer action. The modulus of elasticity (MOE) increases the curves of hexamine sulfate‐catalyzed MUF resins, confirming this trend. The resins are faster curing than when catalyzed by ammonium sulfate. The effect is valid within the narrow buffering range of pH's used for resin hardening. Polycondensation is far too slow to occur at a much higher pH, and degradation is, instead, more predominant at much lower pH's. The network formed is then more crosslinked and less tainted by degradation when curing occurs within the correct pH range. The result is a much better performance of the wood board after water attack. The effects induced by hexamine sulfate effects are of longer duration than those of other potential buffers. This is due to the hexamine sulfate heat stability under standard hot curing conditions of the resin. Alternate systems were found and shown to have a comparable effect. © 2003 Wiley Periodicals, Inc. J Appl Polym Sci 90: 215–226, 2003

Country
Italy
Related Organizations
Keywords

Adhesives; Polycondensation; Resins; Strength; Structure-property relations;

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
22
Top 10%
Top 10%
Top 10%
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