
Sketch of the configuration of a light-controlled resistive switching memory. Light enters through the Al(2) O(3) uncovered surface and reaches the optically active p-Si substrate, where carriers are photogenerated and subsequently injected in the Al(2) O(3) layer when a suitable voltage pulse is applied. The resistance of the Al(2) O(3) can be switched between different non-volatile states, depending on the applied voltage pulse and on the illumination conditions.
Silicon, Light, OXIDE THIN FILMS, LIGHT SENSING, Silicon Dioxide, RESISTIVE SWITCHING, MEMORY DEVICES, Semiconductors, https://purl.org/becyt/ford/1.3, Aluminum Oxide, https://purl.org/becyt/ford/1
Silicon, Light, OXIDE THIN FILMS, LIGHT SENSING, Silicon Dioxide, RESISTIVE SWITCHING, MEMORY DEVICES, Semiconductors, https://purl.org/becyt/ford/1.3, Aluminum Oxide, https://purl.org/becyt/ford/1
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