
Article presents the results on deposition of boron-containing coating on Ti substrate. The synthesis of the coating took place in plasma produced by electron beam in fore-vacuum (1-100 Pa) pressure range, during evaporation of boron followed by ionization of boron particles by the same electron beam. We show the results of study of coatings surface.
материаловедение, электронные ресурсы, твердость, электронно-лучевой синтез, износостойкие покрытия, износостойкость
материаловедение, электронные ресурсы, твердость, электронно-лучевой синтез, износостойкие покрытия, износостойкость
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