
Плазма, генерируемая высокочастотным разрядом, обладает рядом преимуществ по сравнению с другими плазменными источниками. Рассмотрен механизм формирования нанодиффузных структурированных слоев. Рассмотрены преимущества и недостатки методов. Показана перспективность высокочастотной обработкиThe plasma generated by means the high-frequency discharge has a number of advantages in comparison with other plasma sources. The mechanism of formation of the nano-diffusion structured layers is considered. Advantages and shortcomings of methods are considered. Prospects of high-frequency processing are shown.
ЭЛЕКТРОФИЗИЧЕСКИЕ МЕТОДЫ ОБРАБОТКИ, ПОВЕРХНОСТЬ, ДИФФУЗИОННЫЕ СЛОИ
ЭЛЕКТРОФИЗИЧЕСКИЕ МЕТОДЫ ОБРАБОТКИ, ПОВЕРХНОСТЬ, ДИФФУЗИОННЫЕ СЛОИ
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